So I see benefits of increasing resolution. The problem is that when resolution goes up FWC (Full Well Capacity) goes down. What I don't know if this is law of nature or if is possible to make the pixel spacing smaller and maintain FWC? It may be possible by increasing the physical fill factor or by using better dielectrics?
Hi Erik,
AFAIK, the actual conversion/storage of electron charge takes place in a
very thin layer (one or two electrons thick). That's why surface area is dominant in determining the per sensel charge storage capacity ("well depth" in CCDs). Actually in CMOS devices the electrons deplete a preset charge but do so at the immediate dielectric boundary of two layers, so the thin layer principle remains dominant.
For many years now, the charge storage capacity has not changed much, and can often be found to be in the 1500 - 1800 electrons per square micron range. I've read some papers a.o. from Dalsa if I'm not mistaken, about attemtps at 'deeper' wells, but I've not seen
much change coming out of that yet (with 1800 electrons/micron slowly becoming more mainstream than 1500, which is significant but not revolutionary).
Cheers,
Bart